ASML CEO：High NA EUV光刻机2027~2028年用于先进制程量产_老虎社区_美港股上老虎

ASML CEO：High NA EUV光刻机2027~2028年用于先进制程量产

DoNews12-15

ASML CEOChristophe Fouquet 在公司总部接受彭博社专访时表示，预计 High NA EUV 光刻机将于 2027 至 2028 年正式投入先进制程的大规模量产。

目前在导入新一代图案化技术方面最积极的是英特尔代工，其支持 High NA EUV 的 Intel 14A 节点计划于 2027 年正式推出。

Fouquet 指出，High NA EUV 光刻机正由英特尔等客户进行测试，初步结果显示设备的成像与分辨率表现良好；ASML 在 2026 年的重点任务之一是与客户合作，将设备停机时间最小化。

他透露，ASML 已对未来 10 至 15 年的技术发展路径形成初步规划，并已启动下一代Hyper NA EUV的研究工作，为本世纪 30 年代的设备投运奠定基础。

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