阿斯麦CEO：High-NA EUV光刻改进方案已得到验证预计2027至2028年大规模量产_老虎社区_美港股上老虎

阿斯麦CEO：High-NA EUV光刻改进方案已得到验证预计2027至2028年大规模量产

格隆汇12-15

12月15日，阿斯麦（ASML）首席执行官克里斯托夫·富凯表示，公司为High-NA EUV（高数值孔径极紫外光刻机）所设计的光刻改进方案已得到验证，成像效果极佳，分辨率非常出色。目前公司正与客户合作，以全面完善该光刻系统的成熟度。报道称，阿斯麦将与客户密切配合，确保High-NA EUV在明年内实现停机时间降至最低的稳定运行。富凯预计，High-NA EUV将在2027至2028年间实现大规模量产。

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